Zhao Research Group

Thin Film Growth

Experiment

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• H.-N. Yang, Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, “Noise-induced roughening evolution of amorphous Si films grown by thermal evaporation,” Phys. Rev. Lett. 76, 3774 (1996).

• Y.-P. Zhao, J. T. Drotar, G.-C. Wang, and T.-M. Lu, “Roughening in plasma etch fronts of Si(100),” Phys. Rev. Lett. 82, 4882 (1999).

• Y.-P. Zhao, J. B. Fortin, G. Bonvallet, G.-C. Wang, and T.-M. Lu, “Kinetic roughening in vapor deposition polymerization of linear-chain polymer films,” Phys. Rev. Lett. 85, 3229 (2000).

• Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, Reply to Das Sarma's Comment, Phys. Rev. Lett. 86, 2697 (2001).

• T. Karabacak, Y.-P. Zhao, Jason T. Drotar, G.-C. Wang, and T.-M. Lu, “Growth-front roughening in amorphous silicon films by sputtering,” Phys. Rev. B 64, 085323 (2001).

• T. Karabacak, Y.-P. Zhao, Jason T. Drotar, G.-C. Wang, and T.-M. Lu, “Kinetic roughening in silicon nitride films growth by PECVD,” Phys. Rev. B 66, 075329 (2002).

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Theory

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• H.-N. Yang, Y.-P. Zhao, A. Chan, G.-C. Wang, and T.-M. Lu, “Sampling-induced hidden cycles in correlated random rough surface,” Phys. Rev. B 56, 4224 (1997).

• Jason T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, “Numerical analysis of the noisy Kuramoto-Sivashisky equation in 2+1 dimensions,” Phys. Rev. E 59, 177 (1999).

• Y.-P. Zhao, A.R. Hopper, G.-C. Wang, and T.-M. Lu, “Monte Carlo simulation of the initial growth stage in vapor deposition polymerization,” Phys. Rev. E 60, 4310 (1999).

• Jason T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, “Mechanisms for plasma and reactive ion etch-front roughening,” Phys. Rev. B 61, 3012 (2000).

• Jason T. Drotar, Y.-P. Zhao, T.-M. Lu and G.-C. Wang, “Surface roughening in shadowing growth and etching in 2+1 dimensions,” Phys. Rev. B 62, 2118 (2000).

• Jason T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, “Surface-roughening in low-pressure chemical vapor deposition,” Phys. Rev. B 64, 125411 (2001).

• Y.-P. Zhao, Jason T. Drotar, T.-M. Lu, and G.-C. Wang, “Morphology transition during low pressure chemical vapor deposition,” Phys. Rev. Lett. 87, 136102 (2001).

• Wade Bowie and Y.-P. Zhao, “Monte Carlo simulation of vapor deposition polymerization,” Surf. Sci. Lett. 563, L245–L250 (2004).

• S. Tangirala, D. P. Landau, and Y.-P. Zhao, ‘‘Dynamic scaling study of vapor deposition polymerization: a Monte Carlo approach,” Phys. Rev. E 81, 011605 (2010).